6.781J / 2.391J Submicrometer and Nanometer Technology

As taught in: Spring 2006

A nanofabricated electron-beam lithograph.

Bryan Cord nanofabricated this pattern that illustrates the exquisite resolution possible using electron-beam lithography. The principles required to perform this fabrication are described and explained in this course. (Image courtesy of Bryan Cord of the MIT Quantum Nanostructures and Nanofabrication Group.)

Level:

Graduate

Instructors:

Prof. George Barbastathis

Prof. Henry Smith

Prof. Karl Berggren

Course Features

Course Description

This course surveys techniques to fabricate and analyze submicron and nanometer structures, with applications. Optical and electron microscopy is reviewed. Additional topics that are covered include: surface characterization, preparation, and measurement techniques, resist technology, optical projection, interferometric, X-ray, ion, and electron lithography; Aqueous, ion, and plasma etching techniques; lift-off and electroplating; and ion implantation. Applications in microelectronics, microphotonics, information storage, and nanotechnology will also be explored.

Acknowledgements

The Instructors would like to thank Bob Barsotti, Bryan Cord, and Ben Wunsch for their work on the Atomic Force Microscope video. They would also like to thank Bryan Cord for creating each video.

Technical Requirements

Special software is required to use some of the files in this course: .mov.